Learn how to save time and money in controlling CMP and grinding processes in semiconductor industry
After over a decade of close partnerships with leading machine builders in the semiconductor industry, we know full well what the requirements for a stable chemical mechanical polishing (CMP) and grinding process are.
Non-contact, non-destructive optical measuring technology can precisely monitor and control wafer thickness during grinding. Large amounts of sludge can be handled by customized water-jet probes to guarantee an optimum measurement performance.
Further information about our solution for the semiconductor industry can be found in this “CMP and Grinding” whitepaper. Additional highlights include:
- Tactile vs. optical measuring
- Challenges in CMP and grinding
- Our solution for a stable process in a shorter processing time
Download this whitepaper for free now
Discover the CMP and grinding solutions optical measuring technology offers in this whitepaper
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Precitec Optronik GmbH, Schleussnerstr. 54, 63263 Neu-Isenburg, Germany